Albatross™

Low-damage, high-uniformity
plasma treatment system

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Precision plasma processing, redefined

Albatross™ is a single-wafer plasma treatment system engineered to deliver high-density, low-voltage plasma with exceptional within-wafer uniformity and damage-free treatment. Equipped with patented antenna technology and versatile control features, it enables superior process stability for memory and logic applications, all within a 4-chamber architecture built for scalable, high-volume production.

Key features

Dual ICP plasma source, using patented Durosa™ and Trirosa™ (dual/triple-rotated ICP antenna) for high-density, low-voltage plasma, achieving damage-free treatment of sensitive layers.
Proprietary antenna design ensures excellent plasma stability, enabling longer wet clean intervals and consistent particle control over extended runs.
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Operates in both pulse and continuous plasma modes, combined with a bias chuck and multiple WIW tuning knobs for precise uniformity and tailored treatment profiles.
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High-temperature capability up to 600°C with high vacuum configuration and turbo pump for a wide process window.
Available in a 4-chamber configuration to support high throughput and multi-recipe flexibility across logic and memory workflows.

Applications

Memory

From high-speed DRAM to high-density 3D NAND, our systems are trusted in high-volume production by leading memory fabs.

Logic

For leading-edge logic nodes and GAA transistors, our ALD solutions enable precise film control and low-defect integration.

Explore how we’re building trust and efficiency across every touchpoint – from silicon to software

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