QXP 8300 ALD
Eugenus thermal ALD single-wafer multi-station metal deposition platform
The single-wafer multi-station QXP ALD product offers a production-proven platform with superior device results, performance, throughput and reliability for high volume manufacturing. Eugenus now offers legacy support of our global install base of tools.
Multi-stations per process module, combined with station-to-station process isolation, results in film performance equivalent to single wafer tools and enhanced throughput
High temperature capability >630°C
Comprehensive, modular chemical delivery system
Efficient footprint, low cost-of-ownership, and low cost-of-consumables
Unique multi-plenum showerhead designs to ensure precursor isolation for multi-component film deposition