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QXP 8300 ALD

Eugenus thermal ALD single-wafer multi-station metal deposition platform


The single-wafer multi-station QXP ALD product offers a production-proven platform with superior device results, performance,  throughput and reliability for high volume manufacturing. Eugenus now offers legacy support of our global install base of tools.

Key Features


  • Multi-stations per process module, combined with station-to-station process isolation, results in film performance equivalent to single wafer tools and enhanced throughput

  • High temperature capability >630°C

  • Comprehensive, modular chemical delivery system

  • Efficient footprint, low cost-of-ownership, and low cost-of-consumables

  • Unique multi-plenum showerhead designs to ensure precursor isolation for multi-component film deposition

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