A Strong Industry Presence

We are active writers and researchers across numerous technical publications, conferences, and industry events. Take a look at some of our papers over the years, which span a wide range of process technologies and system engineering expertise.

AVD and MOCVD TaCN-based Films for Gate Metal Applications on High-k Gate Dielectrics
ESC Transactions, 2007, Volume 11, Issue 4

 

High Performance ALD Reactor for High-k Films
ECS Transactions, 2007, Volume 3, Issue 15

 

Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-Based Gate Dielectrics
ESC Transactions, 2006, Volume 3, Issue 3

 

Characterization of Charge Storage in ALD Nanolaminates
ESC Transactions, 2006, Volume 1, Issue 5

 

Innovative Deposition Technology for Advanced Materials
ESC Transactions, 2010, Volume 28, Issue 1

 

Growing Innovation and Invention


Better, smarter semiconductor manufacturing is outpaced by computing advances and market demands. This relentless momentum requires new ways of thinking, R&D, and ultimately, technology breakthroughs. We have a legacy of transforming novel scientific designs to domestic and global patents – moving our customers and industry forward.