PUBLICATIONS & PATENTS

TECHNICAL PAPERS

A Strong Industry Presence

We are active writers and researchers across numerous technical publications, conferences, and industry events. Take a look at some of our papers over the years, which span a wide range of process technologies and system engineering expertise.

Modeling Pattern Density Effects in ALD on High-Aspect Ratio Features

ALD 2020: International Conference on Atomic Layer Deposition, June 2020

Structure, Morphology and Mechanical Behavior of ALD TiSiN Films

ALD 2020: International Conference on Atomic Layer Deposition, June 2020

 

Doped Hi-k ALD Films of HfOx and ZrOx for Advanced Ferroelectric and Anti-Ferroelectric Memory Device Applications

ALD 2019: International Conference on Atomic Layer Deposition, July 2019

Antiferroelectricity in Lanthanum Doped Zirconia Without Metallic Capping Layers and Post-Deposition/-Metallization Anneals
Applied Physics Letters, May 2018

Innovative Deposition Technology for Advanced Materials

ESC Transactions, 2010, Volume 28, Issue 1

 

Advances in ALD Equipment for sub-40nm Memory Capacitor Dielectrics: Precursor delivery, Materials and Processes

ESC Transactions, 2008, Volume 16, Issue 4

 

 

AVD and MOCVD TaCN-based Films for Gate Metal Applications on High-k Gate Dielectrics
ESC Transactions, 2007, Volume 11, Issue 4

Characterization of Charge Storage in ALD Nanolaminates
ESC Transactions, 2006, Volume 1, Issue 5

Near-Zero Temperature Coefficient of Resistivity (nz-TCR) of ALD TixSiyNz Films

ALD 2020: International Conference on Atomic Layer Deposition, June 2020

Variable Morphology Highly-Conformal Diffusion Barriers for Advanced Memory and Logic Applications

ALD 2019: International Conference on Atomic Layer Deposition, July 2019

Diffusion Barrier Properties of ALD TiSiN Films

ALD 2019: International Conference on Atomic Layer Deposition, July 2019

 

 

A Compact Model for Metal–Oxide Resistive Random Access Memory With Experiment Verification

IEEE Transactions on Electron DevicesApril 2016

Highly Conformal ALD of ZrO2 at Higher Process Temperatures than the Conventinal TEMAZr-Based Process

ESC Transactions, 2009, Volume 25, Issue 4

 

High Performance ALD Reactor for High-k Films
ECS Transactions, 2007, Volume 3, Issue 15

Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-Based Gate Dielectrics
ESC Transactions, 2006, Volume 3, Issue 3

 

 

OUR PATENTS

Growing Innovation and Invention


Better, smarter semiconductor manufacturing is outpaced by computing advances and market demands. This relentless momentum requires new ways of thinking, R&D, and ultimately, technology breakthroughs. We have a legacy of transforming novel scientific designs to domestic and global patents – moving our customers and industry forward. 

INDUSTRY RESOURCES

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