EUGENUS EDGE
PUBLICATIONS & PATENTS
TECHNICAL PAPERS
A Strong Industry Presence
We are active writers and researchers across numerous technical publications, conferences, and industry events. Take a look at some of our papers over the years, which span a wide range of process technologies and system engineering expertise.
Modeling Pattern Density Effects in ALD on High-Aspect Ratio Features
ALD 2020: International Conference on Atomic Layer Deposition, June 2020
Structure, Morphology and Mechanical Behavior of ALD TiSiN Films
ALD 2020: International Conference on Atomic Layer Deposition, June 2020
Doped Hi-k ALD Films of HfOx and ZrOx for Advanced Ferroelectric and Anti-Ferroelectric Memory Device Applications
ALD 2019: International Conference on Atomic Layer Deposition, July 2019
Antiferroelectricity in Lanthanum Doped Zirconia Without Metallic Capping Layers and Post-Deposition/-Metallization Anneals
Applied Physics Letters, May 2018
Innovative Deposition Technology for Advanced Materials
ESC Transactions, 2010, Volume 28, Issue 1
ESC Transactions, 2008, Volume 16, Issue 4
AVD and MOCVD TaCN-based Films for Gate Metal Applications on High-k Gate Dielectrics
ESC Transactions, 2007, Volume 11, Issue 4
Characterization of Charge Storage in ALD Nanolaminates
ESC Transactions, 2006, Volume 1, Issue 5
Diffusion barrier properties of atomic layer deposited TiSiN films
Materials Letters, Volume 315, 15 May 2022
Near-Zero Temperature Coefficient of Resistivity (nz-TCR) of ALD TixSiyNz Films
ALD 2020: International Conference on Atomic Layer Deposition, June 2020
Variable Morphology Highly-Conformal Diffusion Barriers for Advanced Memory and Logic Applications
ALD 2019: International Conference on Atomic Layer Deposition, July 2019
Diffusion Barrier Properties of ALD TiSiN Films
ALD 2019: International Conference on Atomic Layer Deposition, July 2019
A Compact Model for Metal–Oxide Resistive Random Access Memory With Experiment Verification
IEEE Transactions on Electron Devices, April 2016
ESC Transactions, 2009, Volume 25, Issue 4
High Performance ALD Reactor for High-k Films
ECS Transactions, 2007, Volume 3, Issue 15
Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-Based Gate Dielectrics
ESC Transactions, 2006, Volume 3, Issue 3
OUR PATENTS
Growing Innovation and Invention
Better, smarter semiconductor manufacturing is outpaced by computing advances and market demands. This relentless momentum requires new ways of thinking, R&D, and ultimately, technology breakthroughs. We have a legacy of transforming novel scientific designs to domestic and global patents – moving our customers and industry forward.
INDUSTRY RESOURCES
Whether you’re new to the semiconductor industry or a seasoned veteran, connect with these great resources to learn the trends, technologies, and ideas that matter to our semiconductor world.
